Silicon solar cells

TLDR

High‑efficiency crystalline silicon solar cells require fully activated device volumes, well‑passivated metal contacts, and light‑trapping structures, and the industry is moving toward thinner substrates and thin‑film crystalline silicon to achieve 20 % efficiency from solar‑grade material. The study proposes using a parallel‑multijunction cell structure on low‑quality polycrystalline silicon to achieve fully activated volumes and reasonable efficiencies at low cost over the next decade. This approach employs a parallel‑multijunction architecture that activates the entire cell volume while maintaining low cost. A laboratory thin‑crystalline silicon cell less than 50 µm thick reached 21.5 % efficiency, demonstrating that excellent light trapping can overcome silicon’s poor absorption and validate thin‑film crystalline silicon as a viable high‑performance technology.

Abstract

The key attributes for achieving high-efficiency crystalline silicon solar cells are identified and historical developments leading to their realization discussed. Despite the achievement of laboratory cells with performance approaching the theoretical limit, commercial cell designs need to evolve significantly to realize their potential. In particular, the development of cell structures and processes that facilitate entirely activated device volumes in conjunction with well-passivated metal contacts a nd front and rear surfaces is essential (and yet not overly challenging) to achieve commercial devices of 20% efficiency from solar-grade substrates. The inevitable trend towards thinner substrates will force manufacturers to evolve their designs in this direction or else suffer substantial performance loss. Eventually, a thin-film technology will likely dominate, with thin-film crystalline silicon cells being a serious candidate. Present commercial techniques and processes are in general unsuitable for t hin-film fabrication, with even greater importance placed on the achievement of devices with entirely activated volumes (diffusion lengths much greater than device thicknesses), well-passivated metal contacts and surfaces and the important inclusion of li ght trapping. The recent achievement of 21.5% efficiency on a thin crystalline silicon cell (less than 50 μm thick) adds credibility to the pursuit of crystalline silicon in thin films, with a key attribute of this laboratory cell being its extremely good light trapping that nullifies the long-term criticism of crystalline silicon regarding its poor absorption properties and correspondingly perceived inability to achieve high-performance thin-film devices. For low-cost, low-quality polycrystalline sil icon material, the parallel-multijunction cell structure may provide a mechanism for achieving entirely activated cell volumes with the potential to achieve reasonable efficiencies at low cost over the next decade.