Publication | Closed Access
Low-field amorphous state resistance and threshold voltage drift in chalcogenide materials
365
Citations
17
References
2004
Year
Non-volatile MemoryEngineeringDetailed InvestigationIntrinsic TrapsPhase Change MemoryQuantum MaterialsThreshold Voltage DriftCharge Carrier TransportCell Readout WindowMaterials ScienceElectrical EngineeringPhysicsSemiconductor MaterialMicroelectronicsElectrical PropertyChalcogenide MaterialsApplied PhysicsCondensed Matter PhysicsSemiconductor MemoryAmorphous Solid
A detailed investigation of the time evolution for the low-field resistance R/sub off/ and the threshold voltage V/sub th/ in chalcogenide-based phase-change memory devices is presented. It is observed that both R/sub off/ and V/sub th/ increase and become stable with time and temperature, thus improving the cell readout window. Relying on a microscopic model, the drift of R/sub off/ and V/sub th/ is linked to the dynamic of the intrinsic traps typical of amorphous chalcogenides, thus providing for the first time a unified framework for the comprehension of chalcogenide materials transient behavior.
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