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Cleaning Effects of Running Deionized Water on a GaAs Surface
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1991
Year
Materials ScienceSurface CharacterizationElectrical EngineeringChemical EngineeringEngineeringEnvironmental EngineeringSurface AnalysisSurface ScienceWater PurificationEnvironmental RemediationChemisorptionWater TreatmentInterfacial PhenomenaGallium OxideSurface TreatmentGaas SurfaceGallium OxidesSubstrate Surfaces
The dissolution of arsenic and gallium oxides on surfaces during running deionized water (RDIW) treatment is investigated by x‐ray photoelectron spectroscopy (XPS). RDIW treatment removes arsenic oxide more rapidly than gallium oxide. The addition of ultrasonic washing to the RDIW treatment accelerates the removal of both oxides, resulting in complete removal of both oxides from a surface within 1 h. As a result, this treatment is a promising method for the cleaning of substrate surfaces. The changes in oxide thickness during these treatments are clarified by assuming a double layer structure model.