Publication | Open Access
Total ionizing dose effects in MOS oxides and devices
903
Citations
139
References
2003
Year
Electrical EngineeringIon ImplantationEngineeringDose EffectsPhysicsNanoelectronicsBias Temperature InstabilityOxide ElectronicsApplied PhysicsInterface Trap FormationMos OxidesIon EmissionMicroelectronicsCharge TransportDosimetryCharge Generation
This paper reviews the basic physical mechanisms of the interactions of ionizing radiation with MOS oxides, including charge generation, transport, trapping and detrapping, and interface trap formation. Device and circuit effects are also discussed briefly.
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