ALD-metal uncooled bolometer

Abstract

This paper presents an uncooled infrared bolometer using a metal thin film that is formed by atomic layer deposition (ALD). Nanometer-thick freestanding layers enabled by ALD have the potential to improve the performance of bolometers with achieving low thermal conductance and near optimal optical properties. The fabrication and characterization of the first implementation are described as well as the electrical properties of ALD platinum films.