Deep Etched DBR Gratings in InP for Photonic Integrated Circuits

Abstract

A novel fabrication process was developed to realize high quality SiO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">x</sub> masks for CI <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> based ICP etching of InP. First order DBR mirrors, 3 μm deep, were realized that can be used in photonic circuits. The process can be used in combination with conventional optical lithography, reducing production cost.