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Plasma chemical vapor deposition and properties of hard C3N4 thin films
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1995
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Materials ScienceEngineeringElectronic MaterialsSurface ScienceApplied PhysicsCompact Thin FilmsChemical TransportThin Film Process TechnologyThin FilmsAmorphous C3n4Plasma ProcessingAmorphous SolidChemical Vapor DepositionThin Film Processing
Compact thin films of stoichiometric, amorphous C3N4 have been prepared by means of chemical transport of carbon in intense nitrogen glow discharge at relatively high deposition temperature of about 800 °C. Their hardness reached 2500 Vickers (kg/mm2).