Generation and Self‐Replication of Monolithic, Dual‐Scale Polymer Structures by Two‐Step Capillary‐Force Lithography

Abstract

Inhibition effects in UV radiation curing caused by oxygen are used for fabricating monolithic, micro/nanoscale hierarchical polymer structures via a two-step UV-assisted capillary molding technique (see image). Using this approach, various dual-scale polymer structures are created within a few minutes with precise control over geometrical parameters. Detailed facts of importance to specialist readers are published as ”Supporting Information”. Such documents are peer-reviewed, but not copy-edited or typeset. They are made available as submitted by the authors. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.