Application of Cathode Sputtering for Obtaining Ultra-thin Metallic Coatings on Textile Products

Abstract

The need to protect rooms in which people work and sensitive electronic equipment operates against the negative influence of electromagnetic fields (EMF) requires us to search for better and better screening materials, which at the same time would be economically reasonable, and to elaborate more effective manufacturing methods. This paper presents the possibility of using cathode sputtering, a method well-known in microand opto-electronics, for manufacturing ultra-thin metallic coatings on textile products, especially nonwovens. The quality and thickness of the deposed metal layers were estimated by scanning electron microscopy (SEM), whereas the attenuation of the coated nonwovens was assessed in accordance to a method described in a US standard, here slightly modified. On the basis of the research carried out, we stated that it is possible to manufacture new screening materials in the shape of wallpapers.