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Reliability assessment of AlGaN/GaN HEMT technology on SiC for 48V applications
46
Citations
9
References
2008
Year
Unknown Venue
ReliabilityElectrical EngineeringReliability EngineeringEngineeringHigh Temperature MaterialsGan HemtsReliability AssessmentApplied PhysicsAluminum Gallium NitrideTemperature 48Gan Power DeviceReliability PredictionDevice ReliabilityMicroelectronicsAlgan/gan Hemt Technology
We present wearout reliability assessment of GaN HEMTs fabricated on SiC. Based on 3 temperature 48 V dc stress tests and using a failure criterion of 10% reduction in I <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">dss</sub> , the 60% confidence interval on estimate of E <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">a</sub> was [2.00,2.94] eV and the predicted 60% confidence interval on estimate of MTTF at Tj=200 degC was [1.0 x 10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">6</sup> , 3.0 x 10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">7</sup> ] hours. To compare the impact of dc and RF stress, additional experiments were conducted on a smaller sample set and the results indicate that the impact of dc and RF stress is not significantly different.
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