Advanced Functional Materials · 2011 · 86 citations · 31 references
EngineeringElectrical EngineeringMaterials ScienceMicroelectronicsNanotechnologySemiconductor DevicesBipolar Junction TransistorsDevice ModelingElectron Beam LithographyMemory DevicesMemristive MaterialsNanoimprint LithographyAnalog Switching BehaviorConductanceCrossbar SwitchesCrossbar SwitchingNanoscale InterfacesNonvolatile Memory MaterialsResistive Switching MaterialsResistors
Abstract The logical relationship between two previously defined “memory resistors” is revealed by constructing and experimentally demonstrating a three‐terminal memistor equivalent circuit using two two‐terminal memristors. A technique is then presented, using nanoimprint lithography in combination with angle evaporation, to fabricate a single nanoscale device with a footprint of 4F 2 , where F is the minimum lithographic feature size, that can be operated as either a two‐terminal lateral memristor or a three‐terminal memistor inside a crossbar structure. These devices exhibit repeatable bipolar nonvolatile switching behavior with up to 10 3 ON/OFF conductance ratios, as well as the desired three‐terminal behavior.
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