Effect of total and oxygen partial pressures on structure of photocatalytic TiO2 films sputtered on unheated substrate

Nucleation and growth in TiO2 films prepared by sputtering and evaporation

P. Löbl, M. Huppertz, Dieter Mergel · Thin Solid Films · 1994 · 409 citations

Materials Science, Engineering, Oxide Electronics +7

Photocatalytic TiO2 thin film deposited onto glass by DC magnetron sputtering

Satoshi Takeda, Susumu Suzuki, Hidefumi Odaka et al. · Thin Solid Films · 2001 · 338 citations

Materials Science, Engineering, Photochemistry +7

dc reactive magnetron sputtering of titanium-structural and optical characterization of TiO2 films

Mahdi Hasan Suhail, G. Mohan Rao, S. Mohan · Journal of Applied Physics · 1992 · 295 citations

Optical Materials, Engineering, Thin Film Process Technology +16

Investigations of titanium oxide films deposited by d.c. reactive magnetron sputtering in different sputtering pressures

Lijian Meng, M.P. dos Santos · Thin Solid Films · 1993 · 215 citations

Materials Science, Materials Engineering, Engineering +6

Electronic Properties of the Interface between Si and TiO₂ Deposited at Very Low Temperatures

Takashi Fuyuki, Hiroyuki Matsunami · Japanese Journal of Applied Physics · 1986 · 190 citations

Engineering, Tio 2, Thin Film Process Technology +16