Investigations of titanium oxide films deposited by d.c. reactive magnetron sputtering in different sputtering pressures

Elements of X-ray Diffraction

E. D. T. Atkins · Physics Bulletin · 1978 · 7.1K citations

Natural Sciences, Materials Science, Physics +9

Determination of the thickness and optical constants of amorphous silicon

R. Swanepoel · Journal of Physics E Scientific Instruments · 1983 · 3.9K citations

Natural Sciences, Materials Engineering, Materials Science +17

Optical Properties of Semiconductors

H. R. Philipp, Hannelore Ehrenreich · Physical Review · 1963 · 2.1K citations

Natural Sciences, Materials Science, Physics +12

The microstructure of sputter‐deposited coatings

John A. Thornton · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1986 · 1.3K citations

Natural Sciences, Materials Engineering, Materials Science +16

Electronic band structure of titanium dioxide

Nathalie Daude, Claude Gout, C. Jouanin · Physical review. B, Solid state · 1977 · 421 citations

Natural Sciences, Materials Science, Physics +17