Publication | Closed Access
Investigations of titanium oxide films deposited by d.c. reactive magnetron sputtering in different sputtering pressures
215
Citations
19
References
1993
Year
Materials ScienceMaterials EngineeringEngineeringDifferent Sputtering PressuresApplied PhysicsD.c. Reactive MagnetronThin Film Process TechnologyThin FilmsThin Film Processing
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