Hydrous-Plasma Treatment of Pt Electrodes for Atomic Layer Deposition of Ultrathin High-k Oxide Films

Abstract

Ultrathin and uniform films of thick were successfully grown by atomic layer deposition (ALD) on Pt electrodes in situ treated with hydrous plasma. X-ray photoelectron spectroscopy reveals that the Pt surface can be effectively modified to by the hydrous-plasma treatment. It improves the growth of the oxide films and reduces the leakage in the and capacitors. The enhancement of hydrolysis reaction and chemisorption reactivity of the metal precursors on the hydroxylated surface of Pt is responsible for improvements in the growth and electrical properties of the ALD films.