Development of magnetic tunnel junction for toggle MRAM

H.-J. Kim, Sechang Oh, Jinsoo Bae, K. T. Nam, J.E. Lee, S.O. Park, H.S. Kim, N.I. Lee, U-In Chung, Jung-Hwan Moon,

IEEE Transactions on Magnetics · 2005 · 12 citations · 7 references

Concepts

Abstract

Toggle switching mode MRAM is tested and characterized with respect to the free- and pinned-layer material and thickness. With magnetization curves, we were able to find the optimum thickness combinations of free-layer and spacer materials. For CoFeB where the intrinsic anisotropy field ( Hi) is about 20-30 Oe, one needs to have a reasonably high exchange coupling field (Hex) to ensure large switching margin. In case of an NiFe/Ru/NiFe free-layer, Hi is usually much smaller than Hex, so that further decrease of Hex between two magnetic layers is needed. The pinned-layer roughness and thickness are other factors to be optimized to reduce the toggle switching field. High cell aspect ratio /spl ges/3.0 helps to minimize the switching distribution and enhance the switching stability.

References

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