IEEE Photonics Technology Letters · 2003 · 84 citations · 11 references
Optical MaterialsEngineeringIngan-gan Light-emitting DiodesIto LayerOptoelectronic DevicesElectronic DevicesDry EtchingLight-emitting DiodesTypical Planar LedElectrical EngineeringOptoelectronic MaterialsNew Lighting TechnologyAluminum Gallium NitrideCategoryiii-v SemiconductorWhite OledSolid-state LightingApplied PhysicsGan Power DeviceOptoelectronics
Presents a surface-textured indium-tin-oxide (ITO) transparent ohmic contact layer on p-GaN to increase the optical output of nitride-based light-emitting diodes (LED) without destroying the p-GaN. The surface-textured ITO layer was prepared by lithography and dry etching, and dimensions of the regular pattern were approximately 3 × 3 μm. The operating voltage of the surface-textured LED was almost the same as that of the typical planar LED since the ITO layer was in ohmic contact with the p-GaN. The experimental results indicate that the surface-textured ITO layer is suitable for fabricating high-brightness GaN-based light emitting devices.
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Michael R. Krames, Mari Ochiai-Holcomb, G. E. Höfler et al. · Applied Physics Letters · 1999 · 453 citations
Optical Materials, Engineering, High-power Truncated-inverted-pyramid +17
Low-resistance ohmic contacts to <i>p</i>-type GaN
Jin‐Kuo Ho, Charng-Shyang Jong, Chien C. Chiu et al. · Applied Physics Letters · 1999 · 288 citations