Optically achieved p-i-n diode switch utilizing a two-dimensional laser array at 808 nm as an optical source

A. Rosen, P.J. Stabile, D. Bechtle, W. Janton, A. Gombar, J.C. McShea, A. Rosenberg, P.R. Herczfeld, A. Bahasadri

IEEE Transactions on Electron Devices · 1989 · 14 citations · 9 references

Concepts

Abstract

The design, fabrication, and application of optically activated switches is described. A 0.25-mm-thick Si p-i-n diode, 3.0 mm in diameter, was tested using an 808-nm 2-D diode laser array (measuring about 2 mm*5 mm) as an optical source. Preliminary testing of a 0.25-mm-thick device has demonstrated a holding voltage of 1000 V and a conduction of 10 A upon activation with 200 W of optical power (the pulse width was 10 mu s). The same device, while being pulse biased to 2.0 kV, has demonstrated 20-A pulses (100-ns pulse width) with less than 10-ns risetime. The laser peak power was 500 W.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">&gt;</ETX>

References

9