Metal Organic CVD of Cobalt Thin Films Using Cobalt Tricarbonyl Nitrosyl

Abstract

The combination of Cu and Co in giant magnetoresistance (GMR) structures is something of great interest. Here the same precursor is used as in the previous paper, but for deposition of Co rather than an oxide. Shiny, adherent films can be formed on a range of substrates. SEM analysis shows that the layers are polycrystalline with equiaxial grains (see Figure). Resistivity is reported to be comparable with that of bulk Co.