Three‐Dimensional Nanostructures for Photonics

TLDR

The technology of direct laser writing of 3D polymer nanostructures has matured to the level of a 3D analogue of planar electron‑beam lithography. This review surveys recent progress in direct laser writing of 3D polymer nanostructures for photonics. By combining direct laser writing with atomic‑layer deposition or chemical‑vapor deposition, polymer templates are converted or inverted into high‑refractive‑index 3D nanostructures, enabling designs such as silicon woodpile photonic crystals, optical resonators, chiral photonic crystals, and icosahedral photonic quasicrystals. 3D icosahedral photonic quasicrystals are highlighted as particularly complex structures.

Abstract

Abstract Recent progress in direct laser writing of three‐dimensional (3D) polymer nanostructures for photonics is reviewed. This technology has reached a level of maturity at which it can be considered as the 3D analogue of planar electron‐beam lithography. Combined with atomic‐layer deposition and/or chemical‐vapor deposition of dielectrics—the 3D analogues of planar evaporation technologies, the 3D polymer templates can be converted or inverted into 3D high‐refractive‐index‐contrast nanostructures. Examples discussed in this review include positive and inverse 3D silicon‐based woodpile photonic crystals possessing complete photonic bandgaps, novel optical resonator designs within these structures, 3D chiral photonic crystals for polarization‐state manipulation, and 3D icosahedral photonic quasicrystals. The latter represent a particularly complex 3D nanostructure.