GaAs/GaAlAs selective MOCVD epitaxy and planar ion-implantation technique for complex integrated optoelectronic circuit applications

Abstract

We report on a monolithic integration technique incorporating selective GaAs/GaAlAs optical device epitaxy (based on metalorganic chemical vapor deposition (MOCVD)) and planar ion-implanted GaAs devices, formulated for application to complex integrated optoelectronic circuits. This integration scheme offers fabrication compatibility of epitaxially grown optoelectronic devices with maturing GaAs electronic circuit approaches which require selective multiple implants and small gate geometries. Details of the monolithic integration technique and an example of its application to an optoelectronic transmitter are described.