A novel fabrication of in-channel 3-D micromesh structure using maskless multi-angle exposure and its microfilter application

Abstract

This paper presents a novel fabrication method of in-channel three-dimensional micromesh structures using the conventional photolithography. The micromesh was realized by exposing UV light from the backside of the SU-8 coated metal-patterned glass substrate for different angles. Numbers of exposure and irradiation angle decided the shape and the size of micromesh. Based on this technique, three different micromesh-inserted microchannel structures were fabricated. For hydrodynamic characterization, their flow resistances were measured. Finally, for the application of micro total analysis system (/spl mu/TAS), the microfilter was fabricated and its filtering property was demonstrated.