XHR SEM: enabling extreme high resolution scanning electron microscopy

Abstract

The low voltage scanning electron microscope (SEM) is widely used in many industrial and research applications due to its ability to image surface details and to minimize charging and beam damage effects on sensitive samples. However, fundamental limitations in beam performance have existed, most notably in the chromatic aberration effects, which become larger as the beam voltage is reduced. The introduction of the extreme high resolution (XHR) SEM has demonstrated that sub-nanometer resolution can be achieved at low beam voltages, revealing fine surface detail. This system uses a source monochromator to reduce the effects of chromatic aberrations, resulting in a more tightly focused electron beam. Beam deceleration is available to provide a further improvement in imaging at low voltages and to give additional flexibility in optimizing the image contrast. While the monochromator is a necessary enabler of the improved imaging performance, further system elements, such as scanning, detectors, stage and environmental controls - that go into completing the SEM - are also key to the usability and throughput when it comes to practical day-to-day performance.