Neodymium-doped silica optical waveguide laser on silicon substrate

Abstract

A waveguide laser with a Nd-doped silica core fabricated on a Si substrate using flame hydrolysis deposition and reactive ion etching techniques is described The Nd ion concentration was about 2000 p.p.m. and the optical loss at 1.05 mu m was 0.85 dB/cm. CW lasing at a wavelength of 1.0515 mu m with a threshold of about 150 mW was achieved successfully with pumping at 0.80 mu m.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">&gt;</ETX>