A high-repetition-rate chemical HF laser

T. V. Jacobson, G. H. Kimbell, D. R. Snelling

IEEE Journal of Quantum Electronics · 1973 · 12 citations · 6 references

Concepts

Abstract

An HF chemical laser with a 10-cm-long active volume has been constructed for operation at high pulse repetition rates using TE excitation. Up to 7.2 W of quasi-CW power were produced at 1100 Hz. Powers as high as 160 mW were obtained on a single transition when the cavity was line tuned. The effect of sequential or cascade lasing was observed.

References

6