A line extraction method for automated SEM inspection of VLSI resist

D.B. Shu, C.C. Li, J.F. Mancuso, Yue Sun

IEEE Transactions on Pattern Analysis and Machine Intelligence · 1988 · 22 citations · 7 references

Concepts

Abstract

A precision digital edge-line-detection method is presented that was developed for extracting edge contours of resist lines of submicrometer width as imaged by scanning electron microscopy, as a means of inspection in integrated circuit fabrication. The method is based on a modification of the Hough transform.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">&gt;</ETX>

References

7