Photoinduced depolymerization in poly(olefin sulfone) films comprised of volatile monomers doped with a photobase generator

Abstract

Abstract Photoinduced depolymerization of poly(olefin sulfone)s mixed with a photobase generating compound was investigated. Irradiation of 254 nm UV light to films comprising of a mixture of a photobase generating compound and poly(olefin sulfone)s with volatile monomers caused photoinduced depolymerization and the irradiated part of the film vaporized. The effect of the poly(olefin sulfone) structure on the photoinduced depolymerization process was investigated. © 2012 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2012