Publication | Closed Access
A novel approach to the formation of amorphous carbon nitride film on silicon by ECR-CVD
37
Citations
24
References
1999
Year
Materials ScienceEngineeringNanoelectronicsSurface ScienceApplied PhysicsNovel ApproachSemiconductor Device FabricationAmorphous SolidMicroelectronicsChemical Vapor DepositionThin Film Processing
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