Publication | Closed Access

Deposition of nanocrystalline silicon films (nc-Si:H) from a pure ECWR-SiH4 plasma

Materials ScienceNanocrystalline Silicon FilmsEngineeringNanotechnologyPure Ecwr-sih4 PlasmaSurface ScienceApplied PhysicsSemiconductor Device FabricationThin FilmsChemical DepositionPlasma ProcessingChemical Vapor DepositionSilicon On Insulator