Publication | Closed Access
Dielectric breakdown of PDMS thin films
31
Citations
26
References
2013
Year
Materials ScienceElectrical EngineeringEngineeringElectronic MaterialsFlexible ElectronicsMicrofabricationBreakdown FieldApplied PhysicsTime-dependent Dielectric BreakdownThin Film Process TechnologyPdms Thin FilmsThin FilmsDielectric BreakdownThin Film ProcessingElectrical Insulation
This note presents the data on the dielectric breakdown of polydimethylsiloxane (PDMS) thin films with thicknesses from 2 to 14 μm between the silicon electrodes. The results demonstrate that there is a strong dependence of the breakdown field on both the electrode gap and shape. The breakdown fields range from 250 to 635 V μm−1, depending on the electrode geometry and gap, approaching 10× the breakdown fields for air gaps of the same size. The results are critical for understanding the performance limits of PDMS thin films used in the electromechanical microsystems.
| Year | Citations | |
|---|---|---|
Page 1
Page 1