Effects of processing parameters on the properties of tantalum nitride thin films deposited by reactive sputtering - Concepedia

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Effects of processing parameters on the properties of tantalum nitride thin films deposited by reactive sputtering

45

Citations

18

References

2007

Year

J. Nazon, J. Sarradin, Valérie Flaud, J.C. Tédenac, Nicole Fréty

Journal of Alloys and Compounds

Materials ScienceMaterials EngineeringEngineeringSurface ScienceApplied PhysicsReactive SputteringThin FilmsChemical DepositionChemical Vapor DepositionThin Film Processing

References

	Year	Citations

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