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Regimented placement of self-assembled Ge dots on selectively grown Si mesas
99
Citations
15
References
2000
Year
EngineeringSilicon On InsulatorSelf-assembled Ge DotsBeam LithographySi MesasSiliceneGe ThicknessNanostructure SynthesisNanolithography MethodMaterials SciencePhysicsNanotechnologyGe DotsSemiconductor Device FabricationMicroelectronicsMicrofabricationSelf-assemblySurface ScienceApplied PhysicsGe Dot Growth
The control of positioning of self-assembled dots is critical for the fabrication of regimented arrays in signal processing applications. We report the controllable positioning of self-assembled Ge dots using selectively grown Si mesas as a template. The dependence of the dot arrangement on growth temperature and Ge thickness has been investigated. The experimental results show ability to control the positioning of Ge dots based on energetically preferential nucleation. The Ge dot growth on Si mesas is demonstrated to be a promising way to realize the placement of regimented arrays of self-assembled dots and even a single dot. This technique can be extended to other heterostructure growths.
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