Spectroscopic studies of fluorescent emission in plasma etching of Si and SiO2 and the mechanism of gas-surface interactions - Concepedia

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Spectroscopic studies of fluorescent emission in plasma etching of Si and SiO2 and the mechanism of gas-surface interactions

18

Citations

35

References

1984

Year

D. Field, A.J. Hydes, Derek F. Klemperer

Fluorescent EmissionGas-surface InteractionsEngineeringSurface ScienceApplied PhysicsVacuum DeviceChemistrySilicon On InsulatorPlasma EtchingOptoelectronicsPlasma Processing

References

	Year	Citations

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