Journal of the Physical Society of Japan · 1977 · 21 citations · 5 references
Natural SciencesMaterials EngineeringMaterials ScienceCondensed Matter PhysicsMaterials CharacterizationThin FilmsAmorphous Magnetic MaterialsAmorphous MaterialsAmorphous SolidsMagnetic AnisotropyMagnetic Thin FilmsThin-film MaterialsAmorphous Magnetic FilmsAmorphous Thin FilmsAnisotropy In Thin FilmsPerpendicular Magnetic AnisotropySputteringSputtering EffectsSputtering ProcessesUniaxial Anisotropy
In order to investigate the physical origin of the perpendicular uniaxial anisotropy ( K u ) in the amorphous Gd–Co films, 4π M s and K u of the films prepared under some sputtering conditions were measured. It is found that K u is induced by the preferential resputtering effect of the amorphous Gd–Co films.
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Sputtering Yields at Very Low Bombarding Ion Energies
R. V. Stuart, G. K. Wehner · Journal of Applied Physics · 1962 · 306 citations