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Characterization of Nitrogen-Doped ZnSe and ZnS<sub>0.06</sub>Se<sub>0.94</sub> Films Grown by Metal-Organic Vapor-Phase Epitaxy
36
Citations
9
References
1988
Year
Optical MaterialsEngineeringOptoelectronic DevicesChemistrySemiconductor NanostructuresSemiconductorsIi-vi SemiconductorElectronic DevicesNitrogen-doped ZnseMolecular Beam EpitaxyEpitaxial GrowthCompound SemiconductorMaterials ScienceMaterials EngineeringElectrical EngineeringZns 0.06Crystalline DefectsOxide ElectronicsOptoelectronic MaterialsDoped NitrogenSemiconductor MaterialY LinesApplied PhysicsMetal-organic Vapor-phase EpitaxyThin FilmsOptoelectronicsChemical Vapor Deposition
The relations of doped nitrogen (N) and deep-level emissions such as Y lines (477 nm) and self-activated (SA) emissions (∼580 nm) were investigated in detail by photoluminescence measurements mainly in ZnS 0.06 Se 0.94 films lattice-matched to GaAs. The Y and SA emissions in the N-doped ZnS 0.06 Se 0.94 films both showed appearance of a `threshold' for the incident optical power, indicating the existence of the activation energy on these lines. Persistent photoconductivity was observed for the first time in the N-doped ZnS 0.06 Se 0.94 films which corresponds with the above new finding. The electrical property of the lattice-matched ZnS 0.06 Se 0.94 film was p -type with a carrier concentration of 7×10 15 cm -3 which is the highest carrier concentration ever reported with N-doping, while the lattice-mismatched ZnSe film was highly resistive. It was pointed out that the partial incorporation of the doped N-into the defect sites related to the Y line is still compensating the p -type property, even in the lattice-matched films.
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