Publication | Closed Access
Sputtering by highly charged ions: Application of the XY–TOF technique to secondary ion ejection from LiF
11
Citations
14
References
2007
Year
Ion ImplantationEngineeringPhysicsApplied PhysicsXy–tof TechniqueAtomic PhysicsIon Beam InstrumentationSecondary Ion EjectionIon BeamIon EmissionIon Process
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