Direct writing of optical gratings using a scanning electron microscope

Abstract

The refractive-index change effect due to electron beam irradiation has been successfully applied to write directly optical gratings as large as 0.5 x 0.65 mm(2), with periods of 0.5-2 microm, in amorphous chalcogenide (for example, As(2)S(3), As(40)Se(10)S(40)Ge(10)) films, using a common scanning electron microscope. Fabrication techniques and optical characteristics are discussed.