Deposition of (Ti,Al)N thin films by organometallic chemical vapor deposition: thermodynarnic predictions and experimental results - Concepedia

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Deposition of (Ti,Al)N thin films by organometallic chemical vapor deposition: thermodynarnic predictions and experimental results

25

Citations

22

References

1997

Year

Sandra Gilles, N. Bourhila, S. Ikeda, C. Bérnard, R. Madar

Surface and Coatings Technology

Materials ScienceExperimental ResultsAluminium NitrideEngineeringThermodynarnic PredictionsN Thin FilmsSurface ScienceApplied PhysicsThin FilmsChemical DepositionChemical Vapor DepositionThin Film Processing

References

	Year	Citations

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