Concepedia

Deposition rate characteristics for steady state high power impulse magnetron sputtering (HIPIMS) discharges generated with a modulated pulsed power (MPP) generator

F. Papa, Holger Gerdes, Ralf Bandorf, Arutiun P. Ehiasarian, G. Braeuer, R. Tietema, T. Krug

Thin Solid Films · 2011 · 54 citations · 20 references

DOI

Concepts

References

20

A novel pulsed magnetron sputter technique utilizing very high target power densities

V. Kouznetsov, K. Macák, Jochen M. Schneider et al. · Surface and Coatings Technology · 1999 · 1.1K citations

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High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering

André Anders, Joakim Andersson, Arutiun P. Ehiasarian · Journal of Applied Physics · 2007 · 345 citations · Full text

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Influence of high power densities on the composition of pulsed magnetron plasmas

Arutiun P. Ehiasarian, R. New, W.‐D. Münz et al. · Vacuum · 2002 · 302 citations

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Interface microstructure engineering by high power impulse magnetron sputtering for the enhancement of adhesion

Arutiun P. Ehiasarian, Jianguo Wen, I. Petrov · Journal of Applied Physics · 2007 · 298 citations

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Target material pathways model for high power pulsed magnetron sputtering

D.J. Christie · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2005 · 290 citations

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