Surface processing by gas cluster ion beams at the atomic (molecular) level

Isao Yamada, Jiro Matsuo, Daisuke Takeuchi, Makoto Akizuki, Noriaki Toyoda

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1996 · 68 citations · 0 references

Concepts

Abstract

Gas cluster ion beam techniques have been developed for atomic and molecular level surface modification processing. Shallow implantation, high yield sputtering, surface smoothing, and low damage surface cleaning have been demonstrated experimentally. This article reports recent results concerning surface treatments that are distinctly different from those produced by conventional monomer ion irradiation. Possible applications of gas cluster ion beam processing to new areas of surface modifications are suggested.