Growth of fine holes in polyethyleneterephthalate film irradiated by fission fragments

Abstract

Growth of fine holes by chemical etching in polyethyleneterephthalate films exposed to fission fragments were followed by measuring gas flow through films. The etching rate along tracks and the radial etching rate were determined at hole diameters of 100–3000 Å and hole densities of 106–108/cm2.