Publication | Closed Access
Effects of dilution ratio and seed layer on the crystallinity of microcrystalline silicon thin films deposited by hot-wire chemical vapor deposition
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Citations
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References
2003
Year
Materials ScienceEngineeringDilution RatioMicrofabricationApplied PhysicsThin FilmsSilicon On InsulatorEpitaxial GrowthChemical Vapor DepositionThin Film ProcessingSeed Layer
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