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Characterisation of a-C:H and oxygen-containing Si:C:H films by Raman spectroscopy and XPS

Ii-vi SemiconductorEngineeringNatural SciencesSpectroscopySurface ScienceApplied PhysicsSilicon On InsulatorSemiconductor MaterialHydrogenChemistryThin FilmsH FilmsChemical Vapor DepositionOxygen-containing Si