Applied Physics Letters · 2014 · 52 citations · 17 references
EngineeringMaterials EngineeringMaterials ScienceElectronic MaterialsSemiconductor MaterialsThin FilmsIii-v SemiconductorsSemiconductor Crystal GrowthSemiconductor Device MaterialsSemiconductor Thin FilmsSolar CellsThin-film MaterialsDefect FormationFlexible Solar CellsFlexible SubstratesHeteroepitaxial GrowthMetal-organic Chemical Vapor DepositionPhotoluminescenceThin-film SemiconductorsThin-film Solar Cells
We demonstrate heteroepitaxial growth of single-crystalline-like n and p-type doped GaAs thin films on inexpensive, flexible, and light-weight metal foils by metal-organic chemical vapor deposition. Single-crystalline-like Ge thin film on biaxially textured templates made by ion beam assisted deposition on metal foil served as the epitaxy enabling substrate for GaAs growth. The GaAs films exhibited strong (004) preferred orientation, sharp in-plane texture, low grain misorientation, strong photoluminescence, and a defect density of ∼107 cm−2. Furthermore, the GaAs films exhibited hole and electron mobilities as high as 66 and 300 cm2/V-s, respectively. High mobility single-crystalline-like GaAs thin films on inexpensive metal substrates can pave the path for roll-to-roll manufacturing of flexible III-V solar cells for the mainstream photovoltaics market.
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Extreme selectivity in the lift-off of epitaxial GaAs films
Eli Yablonovitch, T.J. Gmitter, J. P. Harbison et al. · Applied Physics Letters · 1987 · 806 citations · Full text