Atmospheric Plasma Deposition Process: A Versatile Tool for the Design of Tunable Siloxanes‐Based Plasma Polymer Films

Abstract

Abstract This paper aims at describing the synthesis of plasma polymer films by means of atmospheric filamentary plasma dielectric barrier discharge. This work highlights the fact that molecular structures of siloxane based plasma films can be tuned according to the so‐called Yasuda's parameter, which corresponds to the W / F ratios ( W = power discharge; F = Monomer flow rate). Indeed, we showed that the plasma films exhibit a polydimethylsiloxane (PDMS) structure when W / F was low (i.e. when low plasma energy is applied), whereas SiO x structures were rather obtained when W / F is high (i.e. high plasma energy). These results were validated thanks to a wide set of analytical tools allowing to identify two domains where molecular structures of the plasma films swiftly progress from PDMS to SiO x according to W / F ratios. magnified image