Publication | Closed Access
Preparation of HfO2 nano-films by atomic layer deposition using HfCl4 and O2 under atmospheric pressure
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Citations
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References
2004
Year
Materials ScienceChemical EngineeringNanosheetEngineeringNanomaterialsNanotechnologyOxide ElectronicsSurface ScienceAtmospheric PressureHydrogenChemistryChemical DepositionChemical Vapor DepositionAtomic Layer DepositionThin Film Processing
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