Review of Scientific Instruments · 1998 · 152 citations · 26 references
EngineeringElectrical EngineeringInstrumentationSemiconductor DevicesSurface ScienceDevice CharacterizationSurface AnalysisSurface CharacterizationSurface MetrologySurface PhysicsSurface SpectroscopyHigh-resolution Surface ImagingMetal-semiconductor InterfacesSurface PotentialSurface Potential MappingSurface Potential MeasurementWork FunctionWork Function DeterminationWork Function Measurement
We have developed a novel, low cost, scanning Kelvin probe (SKP) system that can measure work function (wf) and surface potential (sp) topographies to within 1 meV energy resolution. The control and measurement subcomponents are PC based and incorporate a flexible user interface, permitting software control of major parameters and allowing easy user implementation via automatic setup and scanning procedures. We review the mode of operation and design features of the SKP including the digital oscillator, the compact ambient voice-coil head-stage, and signal processing techniques. This system offers unique tip-to-sample spacing control (to within 40 nm) which provides a method of simultaneously imaging sample height topographies and is essential to avoid spurious or “apparent” wf changes due to scanning-induced spacing changes. We illustrate SKP operation in generating high resolution wf/sp profiles of metal interfaces (as a tip characterization procedure) and operational electronic devices. The SKP potentially has a very wide range of applications ranging from semiconductor quality control thin film and surface analyses to corrosion and biopotential imaging.
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M. Nonnenmacher, M. O’Boyle, H. K. Wickramasinghe · Applied Physics Letters · 1991 · 2.3K citations
Natural Sciences, Materials Engineering, Materials Science +17
Conyers Herring, M. H. Nichols · Reviews of Modern Physics · 1949 · 957 citations
Dependence of catalytic rates on catalyst work function
C.G. Vayenas, S. Bebelis, S. Ladas · Nature · 1990 · 577 citations