Applied Physics Letters · 1999 · 18 citations · 3 references
Natural SciencesMaterials EngineeringMaterials ScienceOptical MaterialsOptoelectronicsThin FilmsDisplay TechnologiesEpitaxial GrowthLight-emitting DiodesOptical Thin FilmsThin Film AnnealingThin Film Optical PropertiesAnnealing EffectsElectroluminescenceElectroluminescent DisplaysGrain Size ImprovementMolecular Beam EpitaxyPhosphorescent MaterialsPhosphorsThreshold Voltage
Annealing studies are reported on molecular-beam epitaxial grown SrS:Cu which has potential as a blue phosphor for full color electroluminescent (EL) displays. It was found that annealing under a sulfur flux at 650 °C greatly improved film quality and luminescent brightness. This was attributed to the reduction of sulfur vacancies, and a large enhancement in the grain size of these thin-film phosphors. Using this procedure, EL devices with a luminance of 26 cd/m2 at 40 V above the turn-on threshold voltage with chromaticity coordinates of x=0.17, y=0.29 were obtained.
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Charge compensation study of molecular beam epitaxy grown SrS:Ce
W. Tong, L. Zhang, Wounjhang Park et al. · Applied Physics Letters · 1997 · 19 citations