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${\rm Ga}_{2}{\rm O}_{3}{:}{\rm ITO}$ Transparent Conducting Electrodes for Near-Ultraviolet Light-Emitting Diodes
19
Citations
15
References
2014
Year
Thin Film PhysicsNuv LedsEngineering\Rm OOptoelectronic DevicesThin Film Process Technology\Rm Ito\Rm GaIndium Tin OxideThin Film ProcessingThin-film TechnologyMaterials ScienceMaterials EngineeringElectrical EngineeringPhotoluminescenceMaterial PropertyOptoelectronic MaterialsNew Lighting TechnologyIto FilmsThin Film MaterialsWhite OledSolid-state LightingMaterial AnalysisSurface ScienceApplied PhysicsMaterial PerformanceThin FilmsOptoelectronics
Herein, a Ga <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> -based indium tin oxide (Ga <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> :ITO) thin film is proposed as a replacement for ITO in near-ultraviolet light-emitting diodes (NUV LEDs), and its electrical and optical properties are optimized. The measured sheet resistance and optical transmittance of the Ga <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> :ITO thin film were 49 Ω/sq and 93.8% at 405 nm wavelength after optimization, whereas those of ITO films were 52 Ω/sq and 84.4% at that wavelength, respectively. In addition, we found that at 20 mA the output power of the NUV LEDs with Ga <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> :ITO top electrodes was 55% greater than that of those with ITO top electrodes.
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