Photopatterning of Poly(arylene dienylene) by the Photoacid-Catalyzed Deprotection−Elimination Reaction of a Precursor Polymer

Abstract

Precursor polymers prepared from 1,4-dialkoxy-1,4-diarylcyclohexane monomers are converted to the conjugated poly(arylene dienylene)s during the course of an acid-catalyzed deprotection−elimination reaction. These materials are employed as combined active materials and photoresists in the surface patterning of luminescent conjugated polymers.