Roughness in Nb/Cu multilayers determined by x-ray diffraction and atomic force microscopy

K. Temst, M. J. Van Bael, B. Wuyts, C. Van Haesendonck, Y. Bruynseraede, D.G. de Groot, N. J. Koeman, R. Griessen

Applied Physics Letters · 1995 · 31 citations · 0 references

Concepts

Abstract

Nb/Cu multilayers grown by molecular beam epitaxy have been studied by x-ray diffraction and atomic force microscopy. X-ray diffraction provides the average interface roughness while atomic force microscopy shows the roughness and topology of the upper surface. Comparison of both methods shows that high-angle diffraction averages over a lateral length which is in good agreement with the typical grain size.